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Adhesion Aspects of Thin Films, Volume 1

Contents:

Preface
Stresses in thin films
J. Bøttiger, J. Chevallier, P. Kringhøj and K.O.Schweitz
Fundamental aspects of residual stress evolution in thin metal filmsduring energetic particle deposition
A. Misra and M. Nastasi
Surface stress effects on the intrinsic stress in thin films
R.C. Cammarata
Influence of the ion bombardment on the stress in thin films produced byion beam and RF sputtering techniques
S. Scaglione, F. Sarto, A. Rizzo, M. Alvisi and M.A.Tagliente
Delamination of thin hard coatings induced by combined residual stressand topography
U. Wiklund, S. Hogmark and J. Gunnars
Effects of surface treatments on the adhesion of metallic films toceramic substrates
A.J. Pedraza
The state-of-the-art in adhesion of CVD diamond to carbide cuttinginserts
M.A. Taher, W.F. Schmidt, A.P. Malshe, E.J. Oles and A.Inspektor
Adhesion improvement of diamond films to silicon nitride substrate forcutting tools
H. Itoh, R. Sasai, M. Kamiya, S.-S. Lee, K. Kuroda and T.Tsutsumoto
Quantifying the effect of carbon on the practical adhesion of aluminumfilms to sapphire substrates
J.A. Schneider, S.E. Guthrie, W.M. Clift and N.R. Moody
The effect of a titanium-based interlayer on the adhesion of ceramiccoatings
M.T. Vieira, S. Roque and A.S. Ramos
Effect of annealing on residual stress, strength, adhesion and wearresistance of thin, hard coatings on low alloy steel
T.Z. Kattamis and C.G. Fountzoulas
Study of adhesion and tribological properties of some ceramic films
J. Takadoum and B. Cretin
Properties of oxide coatings deposited on a plastic substrate by asuccessive pulsed plasma anodisation process
B.M. Henry, A.G. Erlat, C.R.M. Grovenor, G.A.D. Briggs andR.P. Howson
Practiacal adhesion of organic coatings to metals: The role of theinterphase and its residual stresses
J. Bouchet, A.A. Roche, E. Jacquelin and G.W. Scherer
Epoxy -- diamine adhesives on metal: The interphase formation andcharacterization
S. Bentadjine, A.A. Roche and J. Bouchet
Improving the adhesion of plasma polymerized thin fluorocarbon films onsilicon using (CHF3 + SF6) radio-frequency dischargepretreatments
V. Ianev and N. Schwesinger

2001; viii+270 pages
ISBN 90-6764-338-6
Price (all prices are subject to change without notice): EUR 98/US$ 140


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